Metallurgical Tantalum Powder.jpg
  • Metallurgical Tantalum Powder.jpg

Metallurgical Tantalum Powder 53-150µm


Product Features

Metallurgical Tantalum Powder is made by Radio Frequency Plasma Spheroidization atomized method, which has high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density.
Order(MOQ) : 1 pc
Payment : T/T ; L/C at sight
Product Origin : China
Shipping Port : Foshan / Guangzhou / Shenzhen
Lead Time : 1-7 days

Classification:Metal Powders

Keywords: tantalum powder, tungsten powder


Product details

Stardust company provide spherical chrome powder with high purity, low oxygen, high sphericity , smooth surface, no satellite spheres,  bare hollow particle, uniform particle size distribution, excellent flow properties, and high bulk density and tap density.

Tantalum has excellent biocompatibility. The tantalum implant formed by 3D printing has the elastic modulus closest to human cartilage tissue, making it the most ideal orthopedic implant material. 

Spherical molybdenum powder is suitable for laser/electron beam additive manufacturing,  hot isostatic pressing,  laser cladding, hot/cold coating and other processes.


We can not only provide relatively mature research on pure tantalum spherical powder but also provide 3D printing services, metal spheroidization services, 3D printing machines and devices .


  • Metallurgical Tantalum Powder Particle Size

15-45μm, 53-150μm, 60-100meshes 80-200meshes.

(Various granularities can be customized according to customer requirements)


  • Metallurgical Tantalum Powder Packaging

Vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.


  •  Chemical Composition
Chemical Composition
Element Value (%) Test Method Element Value (%) Test Method
Ta ≥99.95 Ti <0.004 ICP-AES
Fe 0.002 ICP-AES Mo <0.005 ICP-AES
Mg <0.002 ICP-AES W <0.003 ICP-AES
Cu <0.001 ICP-AES Nb <0.01 ICP-AES
Al <0.001 ICP-AES Si <0.005 ICP-AES
Ca <0.001 ICP-AES Cr <0.001 ICP-AES
Sn <0.001 ICP-AES Ni <0.004 ICP-AES
Gas Impurities
Element Value (%) Test Standard Element Value (%) Test Standard
C 0.0015 GB/T 15076.14-2008 O 0.026 GB/T 15076.8-2008
H 0.0014 GB/T 15076.15-2008 N 0.0009 GB/T 15076.13-2017
  • Physical Property
Density (g/cm3)  Hall Flow Rate (s/50g)
Apparent Density Tap Density Test Standard Value Test Standard
7.47 8.96 GB/T 1479-1984
GB/T 5162-2006
7 GB/T 1482-2010



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