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3D Printing Spherical Tungsten Powder 5-25µm

产品型号:


Product Features

球形钨粉采用射频等离子体球化技术制造,具有高纯度、含氧量低、球形度高、表面光滑、无卫星、粒度分布均匀、流动性能优异、松装密度和振实密度高等特点。
订量(最小起订量):按双方确定
付款方式:按双方确定
产品产地:中国
出运:按双方确定
订货交付时间:1-7天

Classification:Metal Powders

Keywords: tantalum powder, tungsten powder

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Product details


Stardust company provide spherical tungsten powder with high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density. With its excellent biocompatibility, tantalum implants formed by 3D printing have the closest elastic modulus to human cartilage tissue and are the most ideal orthopedic implants. Spherical tantalum powder is suitable for laser/electron beam augmentation, hot isostatic pressing, laser cladding, hot/cold spraying, and so on.

 

We can not only provide relatively mature research on pure tungsten spherical powder but also provide 3D printing services, metal spheroidization services, 3D printing machines and devices .

 

  • Spherical Tungsten Powder Particle Size

5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm.

(Various granularities can be customized according to customer requirements)

 

 

  •  Particle Size Distribution Graphic

  • Spherical Tungsten Powder characteristics

High purity (≥99.98%), low oxygen (≤300ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤6.5s/50g), And high bulk density (≥10.0g/cm³) and tap density (≥12.0g/cm³).

 

  • Spherical Tungsten Powder Applicable Progress
  1. Laser/electron beam additive manufacturing (SLM/EBM, 3D printing)
  2. Laser direct deposition (DLD)
  3. Powder hot isostatic pressing (HIP)
  4. Metal injection molding (MIM)
  5. Powder metallurgy (PM)
  6. Laser cladding ( LC), and other processes.

 

  • Spherical Tungsten Powder Packaging

Vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.

 

  •  Chemical Composition
    Chemical Composition
    Element Value (%) Test Method Element Value (%) Test Method
    W ≥99.98 —— Sn <0.001 ICP-AES
    Al <0.001 ICP-AES Mo <0.001 ICP-AES
    Si <0.002 ICP-AES Cu <0.001 ICP-AES
    Ni <0.001 ICP-AES Fe <0.005 ICP-AES
    Gas Impurities
    Element Value (%) Test Standard Element Value (%) Test Standard
    ≤0.005 GB/T4324-2012 O ≤0.01 GB/T4324-2012
    ≤0.003 GB/T4324-2012 P ≤0.002 GB/T4324-2012

 

  • Physical Property
Density (g/cm3)  Hall Flow Rate (s/50g)
Apparent Density Tap Density Test Standard Value Test Standard
≥10.0 ≥10.0 GB/T 1479-1984
GB/T 5162-2006
≤0.005 GB/T 1482-2010

 

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